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SiOF Film Deposition Using FSi(OC₂H_5)₃Gas in a Helicon Plasma Source

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Author(s)
Choi, Chi Kyu
Publication Year
1998-12
URI
https://oak.jejunu.ac.kr/handle/2020.oak/1672
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
Choi, Chi Kyu. (1998-12). SiOF Film Deposition Using FSi(OC₂H_5)₃Gas in a Helicon Plasma Source. 基礎科學硏究, 제11권 제2호 [1998-12-30], 77-81
Type
Article
ISSN
1225-3200
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