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Electrical Properties of low-Dielectric-Constant SiOC(-H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O₂

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Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
chi kyu choi. (2006-12). Electrical Properties of low-Dielectric-Constant SiOC(-H) Films Prepared by Plasma-Enhanced Chemical Vapor Deposition from Methyltriethoxysilane and O₂. 基礎科學硏究, 19권 2호, 161-165
Type
Article
ISSN
1225-3200
Appears in Collections:
Natural Science > The Journal of Basic Sciences Cheju National University
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