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표면처리를 위한 DBD(Dielectric Barrier Discharge) 상압 플라즈마 소스에 대한 연구

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Alternative Title
Study on Atmospheric Dielectric Barrier Discharge Plasma Source for Surface Processing
Abstract
A special kind of dielectric barrier discharge (DBD) at atmospheric pressure was investigated for the surface processing. Departure from the thermal equilibrium is one of the main parameters which is important for the effective surface treatment. The plasma density, stability and uniformity are the other important parameters. We achieved the high etch rate up to 60 μm/ min with a plasmatron source in the previous study but the affected area was relatively small. In this study, we adopted the plate-plate type dielectric barrier structure. The electrode was constisted of stripe shaped silver coated on the Al₂O₃ dielectric barrier. The size of an electrode was 10 cm x 30 cm. For the large surface processing, our DBD plasma source can be operated as remote type.
The plasma characteristics, depending on various conditions such as the gas composition and frequency were checked by measuring the voltage and current through the oscilloscope. And optical characteristics were also checked for determining the rotational temperature and analysing the emission spectrum. The ashing rate by the DBD plasma source was checked with photoresist coated on the silicon wafer. The change of surface hydrophilic property was tested by measuring the contact angle of water droplet on the silicon and glass plate. The dependency on various conditions such as applied power, the gas composition (Air, Ar,O₂) and flow rate, a distance between electrodes are investigated.
The DBD plasma source showed the ashing rate of 0.3 μm/ min for photo resist coated on the silicon wafer and improved uniformity compared to the conventional source.
Author(s)
임찬주
Issued Date
2008
Awarded Date
2008. 2
Type
Dissertation
URI
http://dcoll.jejunu.ac.kr/jsp/common/DcLoOrgPer.jsp?sItemId=000000004231
Alternative Author(s)
Yim, Chan Joo
Affiliation
제주대학교 대학원
Department
대학원 에너지공학과
Advisor
이헌주
Table Of Contents
Ⅰ. 서론 = 1
Ⅱ. 이론적 배경 = 3
1. 플라즈마 = 3
1) 플라즈마 종류 = 3
2) 플라즈마 변수 = 5
2.1) 플라즈마 밀도 = 5
2.2) 플라즈마 온도 = 6
2. DBD 및 플라즈마 방전이론 = 6
1) DBD = 6
2) 플라즈마 방전이론 = 7
2.1) Townsent 방전이론 = 7
2.2) Meek의 스트리머 방전이론 = 8
2.3) 배리어 방전 = 10
Ⅲ. 실험장치 및 방법 = 12
Ⅳ. 실험결과 및 고찰 = 14
1. 플라즈마의 전기적 특성 = 14
1) Frequency 변화에 따른 power의 변화 = 14
2) Capacitance 변화에 따른 방전 특성의 변화 = 17
3) Gas flow 변화에 따른 power의 변화 = 18
2. 플라즈마의 광학적 특성 = 20
1) DBD에서 wavelength에 따른 OES intensity의 변화 = 20
2) OES를 이용한 플라즈마의 온도 측정 = 22
3. PR의 ashing rate와 접촉각 평가 = 25
Ⅴ. 결론 = 29
참고문헌 = 30
Degree
Master
Publisher
제주대학교 대학원
Citation
임찬주. (2008). 표면처리를 위한 DBD(Dielectric Barrier Discharge) 상압 플라즈마 소스에 대한 연구
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Faculty of Applied Energy System > Energy and Chemical Engineering
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