다이아몬드박막 개선을 위한 플라즈마표면처리 효과

Abstract

A broad spectrum of plasma processing devices for diamond deposition on different materials, such as PECVD(Plasma Enhanced Chemical Vapor Deposition), was developed. Since 1990s nanocrystalline diamond attracts much interest due to the observation, that nanocrystalline diamond, consisting of nanometer-sized diamond crystals, can be used for production of smooth and extremely hard diamond films. Such smooth and thin nanocrystalline diamond films that have extremely large surface densities are highly attractive as an engineering material for electronic and biomedical applications. A number of plasma processing techniques for diamond deposition have been developed in order to improve crystal structure and reduce its cost. Moreover, achieving a high growth rate for diamond deposition has become one of the more important goals nowdays. In our study we consider Al2O3 ceramic substrates for Plasma Surface Treatments in order to improve deposited diamond surface and increase diamond deposition rate by applying DBD(Dielectric Barrier Dischrge) system. Because Plasma Surface Treatments was used as a modification method of material surface properties like surface free energy, wettability, and adhesion. By applying Plasma Surface Treatments diamond films are deposited on the Al2O3 ceramic substrates. DC Arc Plasmatron with mathane and hydrogen gases is used. Deposited diamond films are investigated by SEM(Scanning Electron Microscopy), AFM(Atomic Force Microscopy) and XRD(X-ray Diffractometer). Then the C-H stretching of synthetic diamond films by FTIR(Fourier Transform Infrared Spectroscopy) is studied. As a result, nanocrystalline diamond films were identified by using SEM and diamond properties in XRD peaks at (111, 43.8?), (220, 75.3?) and (311, 90.4?) were shown. Absorption peaks in FTIR spectrum, caused by CHx sp3 bond stretching of CVD diamond films, were identified as well. Finally, we improved such parameters as depostion rate (2.3 μm/h), diamond surface uniformity, and impurities level by applying Plasma Surface Treatments. These experimental results show the importance of Plasma Surface Treatments for diamond deposition by a plasma source.