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Study of Al₂O₃ Thin Films Fabricated through Atomic Layer Deposition on Polymer Substrates

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Abstract
By the name of Almighty Allah, the most merciful, the most beneficent. I would present my humble gratitude in front of Allah, who enabled me to accomplish the dignified cause of education and learning and I would pray to Him that He would make ma able to utilize my knowledge and education for the betterment of humanity and its development. At this important occasion, I acknowledge and salute the vision and support of my father who prophesized this moment many years back.
I am heartily thankful to my supervisor Prof. Kyung Hyun Choi, whom encouragement, guidance and support from the initial to the final level enabled me to develop an understanding of the subject. This thesis would not have been possible without his keen interest and valuable support. Also I would like to pay my thanks to Dr. Chang Young Kim for his full support to cooperation.
I extend my thanks to all my lab colleagues and co-workers (Khalid Rahman, Nauman Malik, Adnan Ali, Navaneethan Duraisamy, Muhammad Naeem Awais, Muhammad Zubair, Murtaza Mehdi, Ganesh Thangaraj, Maria Mustafa, , Ko Jeong-beom, Kim Hyung-Chan, Park Jae-Hee, Yoo Ji-Youne) for the fruitful discussions and helping me out through all the ups and downs of my stay here in Korea. They have been great resources of encouragement and insight into many topics as well as great sounding board for my bizarre ideas. The lovely memories I have with these guys will always be cherished. I would like to especially mention Khalid Rahman and Nauman Malik for their continuous and invaluable support.
Lastly, I offer my regards and blessings to all of those who supported me in any respect during the completion of the project.
Author(s)
카므란 알리
Issued Date
2013
Awarded Date
2013. 2
Type
Dissertation
URI
http://dcoll.jejunu.ac.kr/jsp/common/DcLoOrgPer.jsp?sItemId=000000006316
Alternative Author(s)
Kamran Ali
Affiliation
제주대학교 대학원
Department
대학원 메카트로닉스공학과
Advisor
Choi,Kyung Hyon
Table Of Contents
1. Introduction .................................................................................................................. 1
2. Background .................................................................................................................. 4
2.1 Thin Films Fabrication .......................................................................................... 4
2.2 Atomic Layer Deposition (ALD) .......................................................................... 8
2.3 ALD Precursors ..................................................................................................... 10
2.4 Applications of Atomic Layer Deposition ............................................................. 12
2.5 Atomic Layer Deposition of Al₂O₃....................................................................... 16
2.6 Applications of Al₂?O₃thin films ........................................................................... 18
3. Experimental ................................................................................................................ 19
3.1 Reactor Design for ALD......................................................................................... 19
3.2 Precursors and Substrates ...................................................................................... 22
3.3 Thin Films Deposition ........................................................................................... 24
3.4 Thin Films Characterizations ................................................................................. 27
4. Results and discussions ................................................................................................ 28
4.1 Thickness measurement and Al₂?O₃ALD growth rates ......................................... 28
4.2 Optical Properties of Al₂?O₃ALD thin films ......................................................... 30
4.3 Electrical Properties of Al₂?O₃ALD thin films ...................................................... 35
4.4 Surface Morphology and Conformality of Al₂?O₃ALD thin films ........................ 37
4.5 Composition analysis of Al₂?O₃ALD thin films .................................................... 45
5. Enhancement of Hydrophobicity of Al₂?O₃film with C₃?F?plasma treatment ............. 51
iii

6. Executive Summary ..................................................................................................... 62
7. Conclusion and Future Work ....................................................................................... 65

References .......................................................................................................................... 68
Degree
Master
Publisher
제주대학교
Citation
카므란 알리. (2013). Study of Al₂O₃ Thin Films Fabricated through Atomic Layer Deposition on Polymer Substrates
Appears in Collections:
Faculty of Applied Energy System > Mechatronics Engineering
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