OPC와 SLM을 이용한 Maskless lithography 연구

Abstract

Continuous advancements in microelectronics increase the demand for various portable, user-friendly, and multifunctional electronic devices. This leads product manufacturers to keep changing their products' features and designs and to adopt a small-quantity batch production system to be able to meet their customers' various demands. However, continuous modification of production lines and technologies, such as of PCB, is not time- and cost-effective. Therefore, there is a need for low-cost technology. Employing a new PCB mask replacement technology may yield a low-cost manufacturing process. In practical terms, this means spending less. As a result, price cutting and small-quantity batch production are made possible. One of the new and relatively effective patterning methods is OML, a low-cost and highly productive micropatterning method. OML uses SLM to print the pattern. It has the advantage of being able to easily output a variety of patterns. However, it cannot use all the diffracted light to print the image, because of the inevitable image distortion. Therefore, the OPC method is being actively studied for the correction of the diffraction effects or the reduction of process errors. In this study, a gray-level OPC was used for pattern design to correct the image. The optical system was configured to print the pattern using SLM as a way of using OML to form a micropattern. The results showed the possibility of using the gray-level OPC instead of the conventional OPC.