DC 마그네트론 스퍼터링을 이용한 ITO 전극 단선 repair에 관한 연구

Abstract

Combined technologies of display (display) and input devices widely employed a touch screen technologies in the second half of the 20th century. Due to the rapid development and the miniaturization of communication equipments, the touch screen and its importance is growing up. Various types of touch screen panels (TSP), such as pressure type, resistive type and capacitive type using a transparent electrode has been developed. Capacitive type TSP can be largely divided into two groups: surface capacitive type and the projected capacitive type. Recently, among wide-bandgap oxide semiconductors ITO is widely used due to its relatively low resistance (resistivity) and high visible light transmittance. ITO thin film exhibits the lowest resistivity among the ceramic conductors due to the increased carrier electrons by a non-stoichiometric doping configuration (nonstoichiometry) with Sn. And the high transmittance in the visible region, the low absorption rate in the blue wavelength that is good for the implementation of colors. based on its outstanding electrical and optical properties ITO thin film has a wide range of applications in many fields. However, current ITO based touch screen technology with glass-ITO film G1F(glass-ITO film) method has a failure rate of 10 to 20%, and for glass only G2(glass only) method about 30%. It means that 240 millions of spartphones are bing discarded as defective out of total 800 million smartphone produced in worldwide considering the 30% failure rate of the G2 ITO based touch screens. If the defects of ITO touch screens, such as disconnections/cross-linking could be repaired, it would provide a big economical benefits. The objective of this study is to develop a technique for repairing an ITO based electrode by partial deposition through a slit with DC magnetron spattering technique. By controlling the process parameters (DC Power, introducing oxygen flow rate, substrate temperature control) a large area and uniform ITO film could be deposited on glass substrate by using a DC magnetron sputtering method. Moreover, electrical and optical properties of as prepared ITO thin film were characterized and discussed.