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Influence of thermal treatment of low dielectric constant SiOC(-H) films using MTES/O2 deposited by PECVD

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Author(s)
Chi Kyu Choi
Publication Year
2007-12
URI
https://oak.jejunu.ac.kr/handle/2020.oak/5102
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
Chi Kyu Choi. (2007-12). Influence of thermal treatment of low dielectric constant SiOC(-H) films using MTES/O2 deposited by PECVD. 基礎科學硏究, 20권 2호, 201-206
Type
Article
ISSN
1225-3200
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