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Characteristics of low-k SiOC(-H) films deposited at various substrate temperature by PECVD using DMDMS/O2 precursor

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Author(s)
Won Young Jeung
Publication Year
2007-12
URI
https://oak.jejunu.ac.kr/handle/2020.oak/5103
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
Won Young Jeung. (2007-12). Characteristics of low-k SiOC(-H) films deposited at various substrate temperature by PECVD using DMDMS/O2 precursor. 基礎科學硏究, 20권 2호, 195-199
Type
Article
ISSN
1225-3200
Appears in Collections:
Natural Science > The Journal of Basic Sciences Cheju National University
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