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Chemical structure Evolution of SiOCH Films with Low Dielectric Constant during PECVD and Postannealing

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Author(s)
Choi, Chi Kyu
Publication Year
2003-12
URI
https://oak.jejunu.ac.kr/handle/2020.oak/524
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
Choi, Chi Kyu. (2003-12). Chemical structure Evolution of SiOCH Films with Low Dielectric Constant during PECVD and Postannealing. 基礎科學硏究, 제16권 제2호 [2003-12-30], 129-133
Type
Article
ISSN
1225-3200
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