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Investigations of low dielectric constant SiOC(-H) thin films for inter-layer dielectrics in Cu/Low-K Microelectronic device applications

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Department
제주대학교 대학원 : 물리학과.
Degree
Master
Publisher
제주대학교
Citation
양창실. (2005). Investigations of low dielectric constant SiOC(-H) thin films for inter-layer dielectrics in Cu/Low-K Microelectronic device applications
Type
Dissertation
Appears in Collections:
Faculty of Applied Energy System > Physics
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