Investigations of low dielectric constant SiOC(-H) thin films for inter-layer dielectrics in Cu/Low-K Microelectronic device applications
- Department
- 제주대학교 대학원 : 물리학과.
- Degree
- Master
- Publisher
- 제주대학교
- Citation
- 양창실. (2005). Investigations of low dielectric constant SiOC(-H) thin films for inter-layer dielectrics in Cu/Low-K Microelectronic device applications
- Appears in Collections:
- Faculty of Applied Energy System > Physics
- Files in This Item:
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