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Low-k Fluorinated Amorphous Carbon Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition using CF₄/CH₄mixture gases

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Author(s)
Kim, Doo Chul
Publication Year
2000-12
URI
https://oak.jejunu.ac.kr/handle/2020.oak/1676
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
Kim, Doo Chul. (2000-12). Low-k Fluorinated Amorphous Carbon Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition using CF₄/CH₄mixture gases. 基礎科學硏究, 제13권 제1호 [2000-12-30], 27-35
Type
Article
ISSN
1225-3200
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