Low-k Fluorinated Amorphous Carbon Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition using CF₄/CH₄mixture gases
- Publisher
- 濟州大學校 基礎科學硏究所
- Location
- 대한민국
- Citation
- Kim, Doo Chul. (2000-12). Low-k Fluorinated Amorphous Carbon Films Prepared by Inductively Coupled Plasma Chemical Vapor Deposition using CF₄/CH₄mixture gases. 基礎科學硏究, 제13권 제1호 [2000-12-30], 27-35
- ISSN
- 1225-3200
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Appears in Collections:
- Natural Science > The Journal of Basic Sciences Cheju National University
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