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Formation and Technology of SiOF Films as Intermetal Dielectric by Helicon Wave Plasma CVD

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Author(s)
이광만
Issued Date
1995-12
Type
Article
URI
https://oak.jejunu.ac.kr/handle/2020.oak/7445
Publisher
濟州大學校 基礎科學硏究所
Location
대한민국
Citation
이광만. (1995-12). Formation and Technology of SiOF Films as Intermetal Dielectric by Helicon Wave Plasma CVD. 基礎科學硏究, 제8권 제1호 [1995-12-01], 65-76
ISSN
1225-3200
Appears in Collections:
Natural Science > The Journal of Basic Sciences Cheju National University
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