A Study on the physical properties of carbon-doped silicon oxide low-k thin film with nano-pore structure for ULSI interconnect application
- Department
- 제주대학교 대학원 : 물리학과.
- Degree
- Master
- Publisher
- 제주대학교
- Citation
- 오경숙. (2005). A Study on the physical properties of carbon-doped silicon oxide low-k thin film with nano-pore structure for ULSI interconnect application
- Appears in Collections:
- Faculty of Applied Energy System > Physics
- 파일 목록
-
-
Download
A Study on the physical properties of carbon-doped silicon oxide low-k thin film with nano.pdf
기타 데이터 / 3.1 MB / Adobe PDF
-
Items in Repository are protected by copyright, with all rights reserved, unless otherwise indicated.