A Study on the physical properties of carbon-doped silicon oxide low-k thin film with nano-pore structure for ULSI interconnect application
- Department
- 제주대학교 대학원 : 물리학과.
- Degree
- Master
- Publisher
- 제주대학교
- Citation
- 오경숙. (2005). A Study on the physical properties of carbon-doped silicon oxide low-k thin film with nano-pore structure for ULSI interconnect application
- Appears in Collections:
- Faculty of Applied Energy System > Physics
- Files in This Item:
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